Method of producing magnesium fluoride coating, antireflection coating, and optical element

ABSTRACT

A method of producing a magnesium fluoride coating includes a step of forming a coating by applying a solution containing a fluorine-containing organic magnesium compound represented by the following formula to a base and a step of heat-treating the coating while the coating is being irradiated with a beam of light with a wavelength of 246 nm or less: 
       Mg(CF 3 —X—COO) 2   (1)
 
     wherein X represents a single bond or one of —(CF 2 ) n —, —(CH 2 ) m —, and —CH 2 CF 2 — that may have a substituent, where n and m each represent an integer of 1 to 4. The temperature of the heat-treating step can be 250° C. or lower. The coating can be irradiated with a beam of light with a wavelength of 185 nm or less.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a Continuation of U.S. patent application Ser. No.12/843,687 filed Jul. 26, 2010, which claims priority to Japanese PatentApplication No. 2009-178332 filed Jul. 30, 2009, each of which arehereby incorporated by reference herein in their entireties.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a method of producing a magnesiumfluoride coating, an antireflection coating having a good antireflectioneffect and a low refractive index, and an optical element including theantireflection coating.

2. Description of the Related Art

Conventional antireflection coatings for optical elements, such aslenses, required to have an antireflection effect are known to have amultilayer structure formed by alternately depositing a high-refractiveindex substance such as titanium oxide (TiO₂) or zinc oxide (ZnO₂) and alow-refractive index substance such as magnesium fluoride (MgF₂) by avacuum vapor deposition process. In particular, layers located on theair side are preferably made of a low-refractive index substance; hence,MgF₂, which has a refractive index n_(d) of 1.38 for light with awavelength of 587 nm, has been used to form such layers.

Japanese Patent Laid-Open No. 59-213643 discloses a method of producingan MgF₂ thin film by a wet process instead of vacuum vapor deposition.

Japanese Patent Laid-Open No. 59-213643 also discloses a method ofproducing magnesium fluoride by a thermal disproportional reaction. Inparticular, a fluorine-containing organic magnesium compound or aprecursor thereof is applied to a substrate and is thendisproportionated by heating, whereby magnesium fluoride is produced.

In this method disclosed in Japanese Patent Laid-Open No. 59-213643, thetemperature required to form a magnesium fluoride film by the thermaldecomposition or disproportion of the fluorine-containing organicmagnesium compound is 300° C. or higher.

When the fluorine-containing organic magnesium compound is magnesiumfluorocarboxylate, no MgF₂ film can be obtained unless magnesiumfluorocarboxylate is heated to a higher temperature in accordance withthe increase in molecular weight of a fluorocarboxylic acid used.

In the case of preparing an optical element by forming an MgF₂ thin filmon a base, the heating of the base to a high temperature for the purposeof forming the MgF₂ thin film possibly causes a reduction in dimensionalaccuracy and will cause significant damage depending on a material usedto form the base.

SUMMARY OF THE INVENTION

The present invention has been made in consideration of the backgroundart and provides a method of producing a magnesium fluoride coatingwhich can be obtained by low-temperature heat treatment.

The present invention further provides an antireflection coating whichis produced by the magnesium fluoride coating-producing method and whichhas a high antireflection effect and a low refractive index and alsoprovides an optical element including the antireflection coating.

A method of producing a magnesium fluoride coating according to anembodiment of the present invention includes a step of forming a coatingby applying a solution containing a fluorine-containing organicmagnesium compound represented by the following formula 1 to a base anda step of heat-treating the coating while the coating is beingirradiated with a beam of light with a wavelength of 246 nm or less:

Mg(CF₃—X—COO)₂  (1)

wherein X represents a single bond or one of —(CF₂)_(n)—, —(CH₂)_(m)—,and —CH₂CF₂— that may have a substituent, where n and m each representan integer of 1 to 4.

An antireflection coating according an embodiment of to the presentinvention is produced by the magnesium fluoride coating-producing methodand has a refractive index of 1.35 or less at a wavelength of 587 nm. Anoptical element according to an embodiment of the present inventionincludes the antireflection coating.

According to the present invention, a method of producing a magnesiumfluoride coating which can be obtained by low-temperature heat treatmentcan be provided. An antireflection coating produced by the magnesiumfluoride coating-producing method can be provided. The antireflectioncoating has a high antireflection effect and a low refractive index. Anoptical element including the antireflection coating can be provided.

Further features of the present invention will become apparent from thefollowing description of exemplary embodiments with reference to theattached drawing.

BRIEF DESCRIPTION OF THE DRAWING

The FIGURE is a schematic view illustrating an example of aheat-treating step used herein.

DESCRIPTION OF THE EMBODIMENTS

Embodiments of the present invention will now be described in detail.

A method of producing a magnesium fluoride coating according to anembodiment of the present invention includes a step of forming a coatingby applying a solution containing a fluorine-containing organicmagnesium compound represented by the following formula 1 to a base anda step of heat-treating the coating while the coating is beingirradiated with a beam of light with a wavelength of 246 nm or less:

Mg(CF₃—X—COO)₂  (1)

wherein X represents a single bond or one of —(CF₂)_(n)—, —(CH₂)_(m)—,and —CH₂CF₂— that may have a substituent, where n and m each representan integer of 1 to 4. Examples of X in the above formula include singlebonds, —CF₂—, —(CF₂)₂—, —(CF₂)₃—, —(CF₂)₄—, —CH₂—, and —CH₂CF₂—.

The fluorine-containing organic magnesium compound used herein can beobtained by the reaction of a fluorocarboxylic acid with magnesium or amagnesium compound which is a source of magnesium.

Examples of the magnesium compound include magnesium acetate andmagnesium alkoxides.

The fluorocarboxylic acid may have a CF₃ group at its terminal and canbe a compound represented by the following formula 2:

CF₂—X—COOH  (2)

wherein X represents a single bond or one of —(CF₂)_(n)—, —(CH₂)_(m)—,and —CH₂CF₂— that may have a substituent, where n and m each representan integer of 1 to 4.

Examples of the fluorocarboxylic acid represented by Formula (2) includeperfluorocarboxylic acids such as trifluoroacetic acid (CF₂COOH),pentafluoropropionic acid (CF₂CF₂COOH), heptafluorobutyric acid(CF₂(CF₂)₂COOH), nonafluorovaleric acid (CF₂(CF₂)₂COOH), andundecafluorohexanoic acid (CF₂(CF₂)₄COOH) and fluorocarboxylic acidshaving a substituent.

Examples of the reaction of trifluoroacetic acid, which is an example ofthe fluorocarboxylic acid, with magnesium or the magnesium compound areas described below:

Mg(CH₃COO)₂+2CF₃COOH→Mg(CF₃COO)₂+2CH₃COOH  (1)

Mg(C₂H_(S)O)₂+2CF₃COOH→Mg(CF₃COO)₂+2C₂H₅OH  (2)

Mg+2CF₃COOH→Mg(CF₃COO)₂+H₂  (3)

Reactions (1) and (2) are equilibrium reactions in solutions andtherefore a step of isolating magnesium trifluoroacetate is necessary.In order to produce magnesium trifluoroacetate, Reaction (3), that is,the reaction of metallic magnesium with trifluoroacetic acid can beused.

A coating solution is prepared by dissolving the fluorine-containingorganic magnesium compound in an organic solvent and is then applied toa base or an optical element, whereby a coating is formed thereon. Knowncoating processes can be used to form the coating: for example, adipping process, a spin coating process, a spraying process, a printingprocess, a flow coating process, and a combination of some of theseprocesses. The thickness of the coating can be controlled by varying thepulling rate of the base or the optical element in the case of using thedipping process, varying the rotation speed of a substrate in the caseof using the spin coating process, or varying the concentration of thecoating solution.

The coating thickness is reduced by a factor of about two to ten by athermal disproportional reaction. The degree of the reduction of thecoating thickness depends on the level of shielding during the thermaldisproportional reaction. The coating thickness is adjusted such thatthe thickness d of the coating subjected to the thermal disproportionalreaction is equal to an integral multiple of the optical thickness λ/4of the coating at a design wavelength λ.

Examples of the organic solvent include alcohols such as methanol,ethanol, 2-propanol, butanol, ethylene glycol, and ethylene glycolmono-n-propyl ether; aliphatic and alicyclic hydrocarbons such asn-hexane, n-octane, cyclohexane, cyclopentane, and cyclooctane; aromatichydrocarbons such as toluene, xylene, and ethylbenzene; esters such asethyl formate, ethyl acetate, n-butyl acetate, ethylene glycolmonomethyl ether acetate, ethylene glycol monoethyl ether acetate,ethylene glycol monobutyl ether acetate; ketones such as acetone, methylethyl ketone, methyl isobutyl ketone, and cyclohexanone; ethers such asdimethoxyethane, tetrahydrofuran, dioxane, and diisopropyl ether;chlorinated hydrocarbons such as chloroform, methylene chloride, carbontetrachloride, and tetrachloroethane; and aprotic polar solvents such asN-methylpyrrolidone, dimethylformamide, dimethylacetoamide, and ethylenecarbonate. In view of the stability of the coating solution, at leastone of the alcohols may be used to prepare the coating solution.

The organic solvent is appropriately selected depending on a coatingprocess used. When the evaporation rate of the organic solvent isextremely high, the coating is likely to be non-uniform. The use of asolvent with low vapor pressure is effective in improving the uniformityof the coating. After the coating is formed by applying the coatingsolution, which contains the fluorine-containing organic magnesiumcompound, to the base, the coating is heat-treated while beingirradiated with beams of light, whereby a magnesium fluoride coating isformed. The FIGURE is a schematic view illustrating an example of aheat-treating step used herein. With reference to the FIGURE, referencenumerals 11 to 14 represent the base (support), the coating, a heatingunit, and the light beams, respectively.

The inventors have found that a coating of the fluorine-containingorganic magnesium compound is converted into an MgF₂ coating at atemperature lower than usual thermal decomposition temperatures in sucha manner that this coating is heat-treated while being irradiated withbeams of light in the course of converting this coating into the MgF₂coating by thermal decomposition.

In the course of thermally decomposing the fluorine-containing organicmagnesium compound, heating causes the elimination of fluorine atoms andthe eliminated fluorine atoms are replaced with magnesium-carboxyl groupbonds. This probably produces magnesium fluoride. If the elimination offluorine atoms can be readily caused by light irradiation, adisproportional reaction probably proceeds at a lower temperature tocreate an MgF₂ coating.

The C—F bond energy is known to be 116 kcal/mol as described in R. D.Chambers, Fluorine in Organic Chemistry, John Willey & Sons, 1973, p. 5.The C—F bond energy is equal to the energy of a photon with a wavelengthof 246 nm. The use of light with a wavelength less than 246 nm allowsfluorine atoms to be eliminated.

A light source used herein for light irradiation preferably emits lightwith a wavelength of 246 nm or less, more preferably 10 nm to 185 nm,and further more preferably 150 nm to 185 nm. When ultraviolet raysemitted from the light source have a wavelength less than 150 nm, theultraviolet rays attenuate before the ultraviolet rays reach thecoating. Therefore, it is difficult to uniformly irradiate an opticalcomponent having an irregular shape with the ultraviolet rays. The lightsource can be a metal halide lamp, an excimer lamp, a deep ultravioletlamp, or a low-pressure mercury lamp. In particular, the low-pressuremercury lamp can emit ultraviolet light with a wavelength down to 185 nmand therefore is useful in obtaining a metal fluoride by the eliminationof fluorine atoms.

High-pressure mercury lamps cannot emit light with a wavelength lessthan 254 nm and therefore are incapable of cleaving C—F bonds. In thepresent invention, the irradiation of ultraviolet light and heattreatment are performed in combination; hence, the fluorine-containingorganic magnesium compound can be decomposed at a temperature lower thana usual thermal decomposition temperature, whereby the MgF₂ coating isobtained.

The term “usual thermal decomposition temperature” as used herein refersto a temperature at which the fluorine-containing organic magnesiumcompound can be thermally decomposed only by heat and represents anexothermic peak due to thermal decomposition as observed bythermogravimetry-differential thermal analysis (TG-DTA) and/or a pointof infection in weight reduction.

The decomposition of the fluorine-containing organic magnesium compoundcan be promoted by light irradiation. In the case of performing no lightirradiation, the fluorine-containing organic magnesium compound needs tobe heated to 300° C. or higher. When the fluorine-containing organicmagnesium compound is irradiated with light, the fluorine-containingorganic magnesium compound is decomposed at a temperature of 200° C. orlower and thereby magnesium fluoride is produced.

In the present invention, the following process may be used: a processin which the temperature of heat treatment is 250° C. or lower and inwhich light with a wavelength of 185 nm or less is applied or a processin which the temperature of heat treatment is 200° C. or lower and inwhich light with a wavelength of 185 nm or less is applied. A heatingunit used herein can be a known one such as a hot plate including aheating wire, an oven, a hot-air dryer, a vacuum dryer, or an infraredlamp. The heating time of the base is preferably five minutes to twohours and more preferably ten minutes to one hour. When the heating timeof the base is less than five minutes, the temperature of the base isnot sufficiently increased and therefore reaction efficiency is notincreased. In this case, it is effective that the base is heated inadvance of light irradiation and then irradiated with light.

In the present invention, various types of glass can be used to form thebase. Examples of glass used herein include alkali-free glass,aluminosilicate glass, borosilicate glass, high-refractive indexlow-dispersion glass containing barium or a rare-earth element, andfluorine-containing low-refractive index glass. An antireflectioncoating according to an embodiment of the present invention is producedby the magnesium fluoride coating-producing method and has refractiveindex of 1.35 or less for d-line (a wavelength of 587 nm).

The antireflection coating is made of magnesium fluoride. Layers forimparting various functions may be provided on the antireflectioncoating. For example, a hard coat layer for increasing the hardness ofthe antireflection coating may be provided on the antireflection coatingand an adhesive or primer layer for increasing the adhesion between thehard coat layer and a transparent base may be provided on the hard coatlayer. A layer provided between the transparent base and the hard coatlayer can have a refractive index that is between the refractive indexof the transparent base and the refractive index of the hard coat layer.

The antireflection coating has a low refractive index. The single use ofthe antireflection coating or the use of the antireflection coating incombination with a multilayer coating in an optical element allows theoptical element to have good antireflective properties. When theantireflection coating is located at the top of a multilayer structure,the multilayer structure has low interface reflection and enhancedoblique incidence properties because the antireflection coating has alow refractive index.

The antireflection coating is applicable to various optical elementssuch as camera lenses, binoculars, and display apparatuses and is alsoapplicable to windowpanes.

EXAMPLES

The present invention is further described below in detail withreference to examples. The present invention is not limited to theexamples.

Example 1

A soda lime glass substrate having a diameter of 30 mm and a thicknessof 1 mm was ultrasonically cleaned in isopropyl alcohol and was thendried, whereby a glass substrate for coating was prepared. To one masspart of powdery magnesium available from Kishida Chemical Co., Ltd. and18 mass parts of 1-butanol, 25 mass parts of trifluoroacetic acid(CF₃COOH) was gradually added, whereby magnesium was completelydissolved. A solution containing completely dissolved magnesium wasfiltered and was then vacuum-dried, whereby magnesium trifluoroacetatewas obtained.

In 14 mass parts of isopropyl alcohol, one mass part of magnesiumtrifluoroacetate obtained as described above was dissolved, whereby acoating paint was prepared. After the coating paint was applied to theglass substrate by spin coating, the glass substrate was heat-treated ata temperature of 200° C. for ten minutes with a hot plate while theglass substrate was being irradiated with ultraviolet light with awavelength of 185 nm using a low-pressure mercury lamp, PL16-110,available from SEN LIGHTS CORPORATION. A coating was thereby formed onthe glass substrate.

The obtained coating was measured for refractive index with anellipsometer. The refractive index thereof is shown in Table 1. Thereaction temperature of the coating paint was measured with athermogravimetry-differential thermal analyzer (TG-DTA), TG8120,available from Rigaku Corporation. The measurement results are shown inTable 1.

[Analysis of Refractive Index]

The refractive index of the coating was analyzed at a wavelength of 190to 1,000 nm by polarimetry using a spectroscopic ellipsometer, M-2000D,available from J. A. Woollam Japan Co., Inc.

Example 2

A coating was prepared and evaluated in the same manner as thatdescribed in EXAMPLE 1 except that pentafluoropropionic acid(CF₃CF₂COOH) was used instead of trifluoroacetic acid.

Example 3

A coating was prepared and evaluated in the same manner as thatdescribed in EXAMPLE 1 except that heptafluorobutyric acid(CF₃(CF₂)₂COOH) was used instead of trifluoroacetic acid.

Example 4

A coating was prepared and evaluated in the same manner as thatdescribed in EXAMPLE 1 except that nonafluorovaleric acid(CF₃(CF₂)₃COOH) was used instead of trifluoroacetic acid.

Example 5

A coating was prepared and evaluated in the same manner as thatdescribed in EXAMPLE 1 except that undecafluorohexanoic acid(CF₃(CF₂)₄COOH) was used instead of trifluoroacetic acid.

Example 6

A coating was prepared and evaluated in the same manner as thatdescribed in EXAMPLE 1 except that 3,3,3-trifluoropropoinic acid(CF₃CH₂COOH) was used instead of trifluoroacetic acid.

Examples 7 to 12

Coatings were prepared and evaluated in the same manners as thosedescribed in EXAMPLES 1 to 6 except that glass substrates coated withcoating paints were heated at 250° C. for ten minutes with a hot platewhile the glass substrates were being irradiated with ultraviolet light.

Examples 13 to 18

Coatings were prepared and evaluated in the same manners as thosedescribed in EXAMPLES 7 to 12 except that a metal halide lamp was usedto irradiate glass substrates coated with coating paints withultraviolet light.

Examples 19 and 20

Coatings were prepared and evaluated in the same manner as thatdescribed in EXAMPLE 1 except that glass substrates coated with coatingpaints were heated for 20 or seven minutes with a hot plate while theglass substrates were being irradiated with ultraviolet light.

Comparative Examples 1 to 6

Coatings were prepared and evaluated in the same manner as thatdescribed in EXAMPLE 1 except that light irradiation was not performed.No set-to-touch coatings were formed under this condition.

Comparative Example 7

A coating was prepared and evaluated in the same manner as thatdescribed in EXAMPLE 1 except that heat treatment was not performed. Noset-to-touch coating was formed under this condition.

Comparative Example 8

A coating was prepared and evaluated in the same manner as thatdescribed in EXAMPLE 1 except that a high-pressure mercury lamp, EX-250,available from Ushio Inc. was used to obtain ultraviolet light with awavelength of 254 nm. No set-to-touch coating was formed under thiscondition.

COMPARATIVE EXAMPLE 9

A coating was prepared and evaluated in the same manner as thatdescribed in COMPARATIVE EXAMPLE 8 except that a glass substrate coatedwith a coating paint was heated at 250° C. No set-to-touch coating wasformed under this condition.

TABLE 1 Fluorine-containing organic magnesium Reaction Refractivecompounds temperatures Light sources Heating conditions indexes Example1 Mg(CF₃COO)₂ 266° C. Low-pressure mercury lamp 200° C. for 10 minutes1.29 Example 2 Mg(CF₃CF₂COO)₂ 315° C. Low-pressure mercury lamp 200° C.for 10 minutes 1.29 Example 3 Mg(CF₃(CF₂)₂COO)₂ 339° C. Low-pressuremercury lamp 200° C. for 10 minutes 1.29 Example 4 Mg(CF₃(CF₂)₃COO)₂332° C. Low-pressure mercury lamp 200° C. for 10 minutes 1.27 Example 5Mg(CF₃(CF₂)₄COO)₂ 338° C. Low-pressure mercury lamp 200° C. for 10minutes 1.25 Example 6 Mg(CF₃CH₂COO)₂ — Low-pressure mercury lamp 200°C. for 10 minutes 1.35 Example 7 Mg(CF₃COO)₂ 266° C. Low-pressuremercury lamp 250° C. for 10 minutes 1.24 Example 8 Mg(CF₃CF₂COO)₂ 315°C. Low-pressure mercury lamp 250° C. for 10 minutes 1.24 Example 9Mg(CF₃(CF₂)₂COO)₂ 339° C. Low-pressure mercury lamp 250° C. for 10minutes 1.24 Example 10 Mg(CF₃(CF₂)₃COO)₂ 332° C. Low-pressure mercurylamp 250° C. for 10 minutes 1.22 Example 11 Mg(CF₃(CF₂)₄COO)₂ 338° C.Low-pressure mercury lamp 250° C. for 10 minutes 1.21 Example 12Mg(CF₃CH₂COO)₂ — Low-pressure mercury lamp 250° C. for 10 minutes 1.30Example 13 Mg(CF₃COO)₂ 266° C. Metal halide lamp 200° C. for 10 minutes1.29 Example 14 Mg(CF₃CF₂COO)₂ 315° C. Metal halide lamp 200° C. for 10minutes 1.30 Example 15 Mg(CF₃(CF₂)₂COO)₂ 339° C. Metal halide lamp 200°C. for 10 minutes 1.30 Example 16 Mg(CF₃(CF₂)₃COO)₂ 332° C. Metal halidelamp 200° C. for 10 minutes 1.27 Example 17 Mg(CF₃(CF₂)₄COO)₂ 338° C.Metal halide lamp 200° C. for 10 minutes 1.25 Example 18 Mg(CF₃CH₂COO)₂— Metal halide lamp 200° C. for 10 minutes 1.35 Example 19 Mg(CF₃COO)₂266° C. Low-pressure mercury lamp 200° C. for 20 minutes 1.29 Example 20Mg(CF₃COO)₂ 266° C. Low-pressure mercury lamp 200° C. for 7 minutes 1.30Comparative Example 1 Mg(CF₃COO)₂ 266° C. Not used 200° C. NGComparative Example 2 Mg(CF₃CF₂COO)₂ 315° C. Not used 200° C. NGComparative Example 3 Mg(CF₃(CF₂)₂COO)₂ 339° C. Not used 200° C. NGComparative Example 4 Mg(CF₃(CF₂)₃COO)₂ 332° C. Not used 200° C. NGComparative Example 5 Mg(CF₃(CF₂)₄COO)₂ 338° C. Not used 200° C. NGComparative Example 6 Mg(CF₃CH₂COO)₂ — Not used 200° C. NG ComparativeExample 7 Mg(CF₃COO)₂ 266° C. Low-pressure mercury lamp Not heated NGComparative Example 8 Mg(CF₃COO)₂ 266° C. High-pressure mercury lamp200° C. NG Comparative Example 9 Mg(CF₃COO)₂ 266° C. High-pressuremercury lamp 250° C. NG Note: NG indicates that a coating is tackybecause no disproportional reaction proceeds.

According to a method of producing a magnesium fluoride coatingaccording to the present invention, an antireflection coating isobtained by low-temperature heat treatment. The antireflection coatinghas a good antireflection effect and a low refractive index and is madeof magnesium fluoride. The antireflection coating is suitable for use inoptical elements having antireflection performance.

While the present invention has been described with reference toexemplary embodiments, it is to be understood that the invention is notlimited to the disclosed exemplary embodiments. The scope of thefollowing claims is to be accorded the broadest interpretation so as toencompass all such modifications and equivalent structures andfunctions.

This application claims the benefit of Japanese Patent Application No.2009-178332 filed Jul. 30, 2009, which is hereby incorporated byreference herein in its entirety.

What is claimed is:
 1. A method of producing a magnesium fluoridecoating, comprising: forming a coating by applying a solution containinga fluorine-containing organic magnesium compound represented by thefollowing formula to a base; heat-treating the coating; irradiating thecoating with a beam of light with a wavelength of 246 nm or less,wherein the heat-treating and the irradiating are performed incombination, so that the fluorine-containing organic magnesium compoundis decomposed:Mg(CF₃—X—COO)₂  (1) wherein X represents a single bond or one of—(CF₂)_(n)—, —(CH₂)_(m)—, and —CH₂CF₂— that may have a substituent,where n and m each represent an integer of 1 to
 4. 2. The methodaccording to claim 1, wherein the temperature of the heat-treating stepis 250° C. or lower and the coating is irradiated with a beam of lightwith a wavelength of 185 nm or less.
 3. The method according to claim 1,wherein the temperature of the heat-treating step is 200° C. or lowerand the coating is irradiated with a beam of light with a wavelength of185 nm or less.
 4. A method of producing an antireflection coatingcontaining magnesium fluoride including the steps of the methodaccording to claim
 1. 5. The method according to claim 4, wherein theantireflection coating has a refractive index of 1.35 or less at awavelength of 587 nm.
 6. A method of producing an optical elementcomprising the antireflection coating produced by the method accordingto claim 4.